The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Apr. 14, 1998
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A system for treatment of semiconductor substrates is comprised of an ozone generating means ( ) , an ejector ( ) which dissolves ozone in a chemical solution or pure water to be used for treatment of semiconductor substrates, an ultraviolet light irradiating means ( ) which irradiates the ozone-containing chemical solution or pure water with ultraviolet light, thereby controlling the concentration of ozone in the chemical solution or pure water, and a treating vessel ( ) in which semiconductor substrates are treated with the chemical solution or pure water containing ozone in controlled concentrations. A system of wet-cleaning and etching of semiconductor substrates is provided having high yields without roughening the surface of the substrates.