The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2002

Filed:

Jan. 31, 2000
Applicant:
Inventors:

L. William Dewey, Wappingers Falls, NY (US);

Peter A. Habitz, Hinesburg, VT (US);

Judith H. McCullen, Essex Junction, VT (US);

Edward W. Seibert, Richmond, VT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

A method and structure for a method of determining characteristics of parasitic elements in an integrated circuit comprising, identifying manufacturing process parameters of devices in the integrated circuit, calculating a parasitic performance distribution for each of the devices based on the manufacturing process parameters, combining the parasitic performance distribution for each of the devices into a net parasitic value, and forming a parameterized model based on the net parasitic values.


Find Patent Forward Citations

Dewey, L.. (2002). Process and system for maintaining 3 sigma process tolerance for parasitic extraction with on-the-fly biasing (U.S. Patent No. 6430729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6430729

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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