The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Mar. 13, 2001
Applicant:
Inventors:
Tiecheng A. Qiao, Webster, NY (US);
Joseph S. Sedita, Albion, NY (US);
Mridula Nair, Penfield, NY (US);
Brian J. Kelley, Farmington, NY (US);
Yongcai Wang, Webster, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/85 ;
U.S. Cl.
CPC ...
G03C 1/85 ;
Abstract
The present invention relates to photographic elements, including photographic prints, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a processing-solution-permeable protective overcoat that is water resistant in the final processed product and which, at the same time, provides improved wet-abrasion resistance.