The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Aug. 29, 2001
Guilhem J. Alibert, Savigny sur Orge, FR;
Nikolaus Boos, Fontainebleau, FR;
Mark D. Salik, Paris, FR;
Corning Incorporated, Corning, NY (US);
Abstract
A method of fabricating a grating in a planar optical device by fabricating a surface grating or by photoinscription. For surface gratings, a method comprises providing a substrate material that includes a substrate layer, a first core layer, a second core layer, and a first photoresist layer. An exposure of a grating and a plurality of alignment marks is formed onto the substrate material. The second core layer is etched to form the grating in the second core layer. A second photoresist layer is deposited on the substrate material that remains after the first etching. An exposure of a waveguide pattern is formed in the first core layer. The first core layer is etched to define a first waveguide in the first core layer, where the first waveguide includes a first portion having the surface grating. For photoinscription, the fabrication method comprises providing a substrate material that includes a substrate layer, a core layer, and a first photoresist layer. A first photo-mask that includes a plurality of alignment marks is disposed between the first photoresist and a light source. An exposure of the first photo-mask is performed and the alignment marks are etched into the core layer. A grating is written into the core layer by a photosensitive effect. A second photoresist layer is deposited on the substrate material and an exposure of a waveguide pattern is formed in the core layer. The core layer is etched to define a first waveguide in the core layer, where the first waveguide includes a first portion having the surface grating.