The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
May. 01, 2000
Kevin T. Look, Fremont, CA (US);
Shih-Cheng Hsueh, Fremont, CA (US);
Xilinx, Inc., San Jose, CA (US);
Abstract
Described are mask-alignment detection structures that measure both the direction and extent of misalignment between layers of an integrated circuit. Each structure includes one or more MOS transistors, each of which exhibits a threshold voltage that varies with misalignment in one dimension. The test structures are configured in mirrored pairs, so that misalignment in one direction oppositely affects the threshold voltages of the paired structures. The threshold voltages of the paired structures can therefore be compared to determine the extent and direction of misalignment. Measurements in accordance with the invention are relatively insensitive to process variations, and the structures using to take these measurements can be formed along with other features on an integrated circuit using standard processes. One embodiment of the invention may be used to measure misalignment between active implants and the windows in which active regions are formed. Other embodiments measure misalignment between threshold-voltage implants and-the active regions.