The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
Jul. 01, 1999
Applicant:
Inventors:
Lih-Ping Li, Taipei, TW;
Li-Mei Chen, Hsinchu, TW;
Chao-Jen Wang, Kaoushung, TW;
Hsin-Hsen Lu, Hsinchu, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 3/314 ; B01F 3/12 ;
U.S. Cl.
CPC ...
C01B 3/314 ; B01F 3/12 ;
Abstract
The invention provides a fast-cured sol material, which is produced by hydrolysis and condensation of the following starting materials: 2-60 parts by weight of a silicon alkoxide; 20-98 parts by weight of an alcohol; 0.5-50 parts by weight of an aqueous media; 0.0001-10 parts by weight of a base; 0.001-30 parts by weight of at least one additive; and optionally 0.0001-10 parts by weight of an acid. A coating of the sol material according to the invention can be directly cured (without aging) to obtain a microporous dielectric film without shrinkage or cracks.