The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
Oct. 28, 1999
Armand P. Neukermans, Palo Alto, CA (US);
Timothy G. Slater, San Francisco, CA (US);
XROS, Inc., Santa Clara, CA (US);
Abstract
A method for fabricating an integrated, micromachined structure, such as a torsional scanner, that includes a reference member, such as a frame, a pair of torsion hinges, and a dynamic member that is coupled to the reference member by the torsion hinges. The method includes providing a wafer that has been formed from silicon material, and that has both a frontside and a backside. A membrane is formed in the wafer by etching a cavity in the silicon material from the backside of the wafer. The method also includes establishing a pattern that defines the mirror surface and the torsion hinges on the frontside of the wafer at the membrane formed therein. The frontside of the wafer is processed to form therein the dynamic member and the torsion hinges that support the dynamic member for rotation about the axis.