The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
May. 24, 2000
Applicant:
Inventors:
Wenhui Mei, Plano, TX (US);
Takashi Kanatake, Dallas, TX (US);
Karlton Powell, Lake Stevens, WA (US);
Assignee:
Ball Semiconductor, Inc., Allen, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/114 ;
U.S. Cl.
CPC ...
G03B 2/114 ;
Abstract
A photolithography system and method for providing a pattern to a subject such as a wafer is provided. The system includes a pixel panel, such as a digital mirror device or a liquid crystal display, for generating for creating a plurality of pixel elements of the pattern. The pixel elements are simultaneously directed to a first site of the subject by a lense system. The system also includes a manipulator for moving the pixel elements, relative to the subject, to a second site of the subject so that a portion of the second site overlaps a portion of the first site.