The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2002
Filed:
Jul. 27, 2001
Applicant:
Inventors:
Richard W. Baker, Palo Alto, CA (US);
Kaaeid A. Lokhandwala, Union City, CA (US);
Johannes G. Wijmans, Menlo Park, CA (US);
Andre R. Da Costa, Palo Alto, CA (US);
Assignee:
Membrane Technology and Research, Inc., Menlo Park, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25J 1/00 ; B01D 5/322 ;
U.S. Cl.
CPC ...
F25J 1/00 ; B01D 5/322 ;
Abstract
A process for treating natural gas or other methane-rich gas to remove excess nitrogen. The invention relies on membrane separation using methane-selective membranes, but does not require the membranes to be operated at very low temperatures. We have found that, by using a two-step membrane system design, and controlling the operating pressures for the membrane steps within certain ranges, the capital and operating costs of the process can be kept within economically acceptable limits.