The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2002
Filed:
Jul. 13, 1999
Abstract
A method for the production of Gaussian intensity distribution in the beam profile of secondary radiation generated by non-linear optical processes, particularly frequency conversion and more particularly frequency doubling of a primary radiation beam. The non-linearly generated, secondary radiation beam is non-Gaussian in profile due to the walk-off effect and has a near field path near the non-linear optical material and a transition field path interconnecting the near field path with a remote, or far, field path. A Gaussian secondary beam profile of substantially circular cross-section is produced at a finite distance from the optical material by providing an optical system in the transition path which, taken as a whole, has no divergence altering or imaging effect on the secondary radiation beam.