The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2002
Filed:
Apr. 09, 1999
Siegfried Panzer, Dresden, DE;
Jürgen Dånhardt, Dresden, DE;
Abstract
Multiple methods are known to process materials or alter their properties using an electron beam. Until now, it was not possible to impinge upon minuscule surface sections (pixel) with a given arrangement on the surface in order to achieve certain effects. According to the invention, the object to be impinged upon is moved contact-free under a mask. A bidimensional deflectable electron beam oscillating at a high frequency perpendicular to the direction of movement of the object is moved on the mask, the speed being essentially faster than that of the movement of the object. Said method can be used for processing any material, preferably plane or band-shaped objects, in order to achieve processing effects by means of physical or chemical reaction.