The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2002

Filed:

Dec. 28, 2000
Applicant:
Inventor:

Tatsuro Maeda, Ibaraki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/144 ; H01L 2/100 ; H01L 2/130 ; H01L 2/148 ;
U.S. Cl.
CPC ...
H01L 2/144 ; H01L 2/100 ; H01L 2/130 ; H01L 2/148 ;
Abstract

A source and a drain of a field-effect transistor are formed so as to fulfill a specified physical relationship to upper and lower gates thereof and thereby parasitic capacitance that hampers its high-speed operation is minimized. The filed-effect transistor includes a second support substrate, a lower gate that is embedded in an insulator formed on the second support substrate, an insulating layer formed on the lower gate, a semiconductor layer formed on the insulating layer, an insulating layer formed on the semiconductor layer, an upper gate formed on the insulating layer, as well as a source electrode, a drain electrode, an upper gate electrode, and a lower gate electrode all of which are isolated from one another by the insulating layer.


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