The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2002
Filed:
Aug. 11, 1997
Applicant:
Inventor:
Yuji Fukazawa, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kanagawa, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 ; B08B 3/08 ; B08B 3/12 ;
U.S. Cl.
CPC ...
B08B 3/00 ; B08B 3/08 ; B08B 3/12 ;
Abstract
In a method for cleaning a semiconductor substrate, ozone water is supplied to a cleaning chamber, which contains the substrate, thereby to oxidize the surface thereof, and thus form a thin oxide film on the surface. After a lapse of a predetermined time period, ammonium hydroxide is mixed with the ozone water, thereby generating a cleaning liquid. The cleaning liquid is applied to the surface of the substrate to clean the surface. At this time, the oxide film reduces the etching rate at which the surface of the substrate is etched when it is cleaned.