The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Mar. 30, 2000
Applicant:
Inventors:
Kimie Takagi, Chiba, JP;
Mikio Suzuki, Chiba, JP;
Emi Shimaoka, Chiba, JP;
Noriyuki Miyamoto, Chiba, JP;
Assignee:
Showa Denko K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/650 ; H05H 1/24 ; B08B 9/08 ; C23F 1/00 ;
U.S. Cl.
CPC ...
C23C 1/650 ; H05H 1/24 ; B08B 9/08 ; C23F 1/00 ;
Abstract
A production process for a magnetic recording medium comprising a non-magnetic substrate, a non-magnetic undercoat film, a magnetic film, and a protective film predominantly comprising carbon, which protective film is formed through a plasma CVD method by use of carbon-containing gas as a source and which process comprises applying an oxygen plasma to carbon deposits on the inner walls of a chamber or carbon present in the chamber for transformation.