The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Sep. 13, 1999
Rudiger Schutte, Alzenau, DE;
Hubertus Eickhoff, Alzenau, DE;
Degussa-Huls AG, Frankfurt, DE;
Abstract
The invention relates to a process for carrying out gas-liquid reactions in a continuous flow reactor having several reactor chambers arranged parallel to one another, open in the direction of flow. The space-time yield can be increased in that a reactor is used with at least three chambers, the ratio of chamber width b to slit width s of which is, on average, greater than 3 and the slit width s of which is in the range of 5 to 100 mm. Preferably, s is in the range of 5 to 50 mm and s/b in the range of 5 to 100. The continuous flow reactor according to the invention with the at least three reactor chambers and the above ratio s/b is preferably tubular and contains one or more plate stacks.