The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Jan. 18, 2001
Toshiaki Anzaki, Osaka-fu, JP;
Kenji Mori, Osaka-fu, JP;
Nippon Sheet Glass Co., Ltd., Osaku-fu, JP;
Abstract
There may be used a film-forming apparatus having a substrate that is rotatable around the center of one rotating axis in the vertical direction situated in an inner cylinder and a plurality (four in FIG. ) of target units each comprising the pair of targets A, B ( B is under A serially arranged in the vertical direction inside an outer cylinder opposite the surface of the substrate which are arranged in parallel in the circumferential direction of the inner wall of the outer cylinder By employing a method whereby voltage is applied while alternatively reversing the polarity to each of the targets A, B, it is possible to form a coating on the surface of a substrate by glow discharge sputtering, to accomplish destaticizing while the sputtering can be carried out using a small in-line or bell jar apparatus with small space.