The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Nov. 21, 2000
Applicant:
Inventors:
Claude Rousseau, Annecy, FR;
Patrick Pilotti, Cran-Gevrier, FR;
Philippe Maquin, St Jean de Sixt, FR;
Assignee:
Alcatel, Paris, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04B 4/900 ;
U.S. Cl.
CPC ...
F04B 4/900 ;
Abstract
The invention relates to a system for regulating the pressure in an enclosure ( ) that is to contain processed gas for manufacturing semiconductor components or micro- or nano-technology devices, the enclosure being connected by pipework ( ) to a pump unit ( ) comprising a dry mechanical primary pump ( ) and at least one secondary pump ( ). According to the invention, the system further comprises a speed controller ( ) controlling simultaneously the speeds of rotation of the dry mechanical primary pump ( ) and of said at least one secondary pump ( ).