The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Mar. 15, 2000
Helmut Schneider, München, DE;
Jürgen Lindolf, Friedberg, DE;
Thomas Borst, Neubiberg, DE;
Hermann Ruckerbauer, Moos, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A sense amplifier configuration includes a semiconductor substrate, a well having a variable well potential and insulated in the semiconductor substrate, and at least one field-effect transistor in the well. The transistor has a short channel length and an adjustable threshold voltage. Locating the field-effect transistor in an insulated well with a controllable potential allows for compensation of deviations in the threshold voltage with the substrate control effect. The threshold voltage can increase with increasingly larger negative voltage values of the well potential. The threshold voltage has an actual value and a target value, and the well potential can be controlled as a function of a difference between the actual and target threshold voltage values. The well potential can vary from approximately +200 mV to −400 mV, and in steps of approximately 50 mV. The field-effect transistor has a switched-off state, and the well potential can be different from an active potential in the switched-off state of the field-effect transistor, preferably, the well potential is 0 V in the switched-off state. The field-effect transistor can be a plurality of field-effect transistors all disposed in the well. The semiconductor substrate, the well, and the field-effect transistor can be fabricated by ion implantation.