The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Aug. 04, 2000
Neil H. Brooks, San Diego, CA (US);
Torkil H. Jensen, Del Mar, CA (US);
Charles P. Moeller, Del Mar, CA (US);
General Atomics, San Diego, CA (US);
Abstract
An apparatus for producing a stable, high pressure plasma column with long length, and high axial uniformity. Rotating a gas-filled tube about an horizontal axis creates a vortex with minimal, or no shear flow. Such a vortex provides a stable equilibrium for a central column of high temperature gas and plasma when, for a given rotation speed, the centrifugal force dominates over the gravitational force inside the smallest radial dimension of the containment envelope. High pressure discharges inside a rotating envelope may be sustained by a variety of energy sources, including electrical, electromagnetic and chemical; they may find application in plasma torches, light sources, etc.