The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Feb. 10, 2000
Arthur A. Eneim, Goleta, CA (US);
Adam M. Kennedy, Santa Barbara, CA (US);
Monesh S. Patel, Goleta, CA (US);
Farhad I. Mirbod, Goleta, CA (US);
Janine F. Lambe, Goleta, CA (US);
Kenneth L. McAllister, Goleta, CA (US);
Stephen R. Gibbs, Santa Barbara, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A sensor/support system includes a sensor assembly having a planar radiation detector lying parallel to a reference plane, a readout circuit, and an interconnect joining the radiation detector to the readout circuit. The system further includes a support structure, the support structure having a platform with a first side to which the sensor assembly is affixed and a second side oppositely disposed from the first side. A shim is affixed to the second side of the platform. The shim is made of a shim material different from the detector material and the platform material. The shim reduces the strain in the interconnect when the temperature of the sensor/support system is changed, as compared with the strain in the interconnect in the absence of the stabilization structure. The shim is selected such that an in-plane strain in the interconnect, measured parallel to the reference plane, during a required thermal excursion is less than a maximum strain difference over the thermal excursion for the interconnect material in low-cycle fatigue for a design number of cycles evaluated over the required thermal excursion.