The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Jan. 04, 2001
Applicant:
Inventors:
Michael P. Keleher, Lockport, NY (US);
Jeffrey A. McKee, Grapevine, TX (US);
Troy H. Herndon, Richardson, TX (US);
Jing-Shing Shu, Richardson, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract
A mask ( ) includes a pattern ( ) having a plurality of substantially rectangular shapes ( ) arranged longitudinally in each of a plurality of substantially parallel rows ( ). The rows ( ) are evenly spaced apart from each other. The substantially rectangular shapes ( ) in each row ( ) are evenly spaced apart from each other and offset from the substantially rectangular shapes ( ) in neighboring rows ( ). The substantially rectangular shapes ( ) define a plurality of T-shapes ( ) connected to and offset from each other.