The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Sep. 26, 2000
Kevin Barry Ray, Castleford, GB;
Christopher David McCullough, Fort Collins, CO (US);
Kodak Polychrome Graphics LLC, Norwalk, CT (US);
Abstract
A method of producing a resist pattern on a substrate using a precursor which comprises a coating composition which includes a heat sensitive polymeric substance having functional groups Q thereon (wherein groups Q may be siloxane or optionally substituted fluoroalkyl groups) wherein groups Q cause the polymeric substance to have a reduced adhesive interaction with ink for use in waterless lithographic printing compared to aid polymeric substance in the absence of said groups, the method including the step of causing the patternwise application of heat to said coating composition and optional development thereby to define ink accepting areas in heat exposed areas and non-ink accepting areas in non-exposed areas.