The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Aug. 13, 2001
Takeshi Nojiri, Iwarna-machi, JP;
Hideyasu Tsuiki, Hitachinaka, JP;
Hiroyuki Tanaka, Mito, JP;
Yumiko Wada, Hitachi, JP;
Seiji Tai, Hitachi, JP;
Seikichi Tanno, Hitachi, JP;
Hajime Kakumaru, Hitachi, JP;
Kazuya Sato, Hitachi, JP;
Naoki Kimura, Hitachi, JP;
Ikuo Mukai, Hitachi, JP;
Hitachi Chemical Co., Ltd., Tokyo, JP;
Abstract
Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9×L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4×L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.