The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
May. 15, 2000
Applicant:
Inventors:
Lin Huang, San Jose, CA (US);
Liji Huang, San Jose, CA (US);
Qixu David Chen, Milpitas, CA (US);
Charles Leu, Fremont, CA (US);
Rajiv Yadav Ranjan, San Jose, CA (US);
Assignee:
Seagate Technology LLC, Scotts Valley, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/64 ;
U.S. Cl.
CPC ...
G11B 5/64 ;
Abstract
Sputter-deposited amorphous metal oxide films on substrates comprising an aluminum-containing support and a Ni-containing pre-coat reduce Ni ion migration significantly from the substrate onto the top surface of the magnetic recording media. Longitudinal magnetic recording media deposited on metal oxide sealing layers have very good magnetic recording performances and are suitable for high density recording application.