The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2002
Filed:
Apr. 11, 2000
Jeanine M. Shusta, Mahtomedi, MN (US);
Norman D. Ligtenberg, Cottage Grove, MN (US);
William B. Robbins, Maplewood, MN (US);
3M Innovative Properties Company, Saint Paul, MN (US);
Abstract
Exposed lens retroreflective appliques incorporate a monolayer of beads and a dielectric mirror proximate the beads. A pigmented or otherwise colored bead bond layer in which the beads are partially embedded is visible through the dielectric mirror, giving the article a highly colored daytime appearance. The appliques exhibit an initial reflectivity. By appropriate materials selection, the appliques can be made to retain at least 75%, and in most instances at least 90%, of the initial reflectivity if subjected to fifty home laundering cycles. In one case the dielectric mirror includes zinc sulfide as a relatively high refractive index material and calcium fluoride as a relatively low refractive index material. In another case the dielectric mirror includes zinc sulfide as the relatively high refractive index material and silicon dioxide as the relatively low refractive index material.