The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Apr. 18, 2000
Takashi Saito, Osaka, JP;
Hisashi Watanabe, Shiga, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A lithography pattern data generation method of this invention includes steps of dividing a predetermined area where said plural design data are arranged, which corresponds to an area where design patterns are to be formed, into plural partial exposure areas each in the shape of a stripe with a width corresponding to a deflection width of an exposure beam; extracting, from the plural design data, design data each falling within any of the plural partial exposure areas as a first design data group and extracting design data each extending over two or more of the plural partial exposure areas as a second design data group; generating first lithography pattern data of each of the plural partial exposure areas from the design data belonging to the first design data group; and generating second lithography pattern data of each of the plural partial exposure areas from the design data belonging to the second design data group.