The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Oct. 01, 2001
Ted Letavic, Putnam Valley, NY (US);
Mark Simpson, White Plains, NY (US);
Koninklijke Philips Electronics N.V., New York, NY (US);
Abstract
A thin layer SOI high-voltage device in which the drift charge is depleted using a three-dimensional MOS capacitor structure. The drift region of the high-voltage semiconductor device is doped with a graded charge profile which increases from source-to-drain. The drift region is physically patterned to create a stripe geometry where individual SOI stripes. Each SOI stripe is individually circumscribed longitudinally by a dielectric layer wherein each dielectric layer is longitudinally circumscribed by field plates of a conducting multi-capacitor field plate layer which is electrically shorted to the substrate. The resultant structure is a thin drift-region stripe which is completely enclosed by a MOS field plate, resulting in three-dimensional depletion upon application of a bias voltage between the SOI stripe and its encapsulating field plates.