The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Sep. 14, 1999
Robert E. Klinkowstein, Winchester, MA (US);
Ruth Shefer, Newton, MA (US);
Barbara J. Hughey, Lexington, MA (US);
Newton Scientific, Inc., Cambridge, MA (US);
Abstract
A method and apparatus for ion beam generation in which acceleration of an ion beam in a first accelerating tube to a high voltage terminal, followed by transport of the beam through the terminal without significant charge changing, and deceleration of the beam substantially to ground potential in a second accelerating tube. Since the terminal is maintained at high voltage, the beam optical characteristics between the ion source and the terminal are identical to those of normal tandem operation. The optical elements of the injector and accelerator beamline can therefore be adjusted to produce an focused beam envelope in the high voltage terminal, allowing the beam to propagate efficiently through an empty stripper canal. Since the beam, does not undergo a charge change in the terminal, it is decelerated in the second tandem accelerating tube. Since the beam propagates through the accelerator at energies higher than the injection energy, expansion of the beam due to space charge and emittance is reduced.