The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
May. 09, 2001
Applicant:
Inventors:
Hidekazu Okamoto, Kanagawa, JP;
Keiichi Ohnishi, Kanagawa, JP;
Assignee:
Asahi Glass Company, Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C 1/738 ;
U.S. Cl.
CPC ...
C07C 1/738 ;
Abstract
A method for reducing the content of unsaturated impurities contained in 1,1,1,3,3-pentafluoropropane (R245fa), while maintaining the loss of R245fa at a minimum level. R245fa containing unsaturated impurities is contacted in a gas phase with chlorine gas in the presence of an activated carbon catalyst, thereby converting the unsaturated impurities to the chlorine addition compounds to reduce the content of the unsaturated impurities.
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Okamoto, Hidekazu. (2002). Method of treating 1,1,1,3,3-pentafluoropropane (U.S. Patent No. 6414203). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6414203
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile