The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Aug. 17, 2000
Vassili Kitch, San Ramon, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A technique is provided for laying out vias between metal layers in an integrated circuit structure utilizing conventional Metal n and Metal N+1 databases. A first database (Metal n) is created that defines a lower conductive layer. A second database (Metal N+1) is created that defines an upper conductive layer. Selected intersections of the first database and the second database are then determined, thereby creating a third database (via n) that defines a pattern of vias between the lower conductive layer and the upper conductive layer. This allows interconnect vias to be optimized in size and shape, thus providing lowest possible interlayer resistance, which in turn provides the best possible circuit performance and reliability.