The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Jun. 15, 2001
Sung Gyu Pyo, Kyungki-Do, KR;
Hynix Semiconductor Inc., Ichon, KR;
Abstract
When forming a metal wiring by depositing copper by chemically enhanced chemical vapor deposition (CECVD) method, the present invention forms a diffusion barrier layer, performs chemical treatment using a chemical enhancer, performs a spin rinsing process using a wet cleaning solution and then leaves the chemical enhancer only at the bottom of a damascene pattern. Thus, the present invention allows selective partial fill of copper at the bottom portion of the hole and can prevent generation of voids or seams at the bottom portion of the hole.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile