The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Nov. 22, 1999
Hiroaki Takeishi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for scanning a reticle and a wafer in synchronism to optically transfer a pattern drawn on the reticle onto the wafer, thereby forming a device. The apparatus includes a first driver for holding and scanning the reticle, a second driver for holding and scanning the wafer, a determining device and a controller. The determining device determines a scanning distance of the first driver and the second driver by a sum of a first distance through which the first driver and the second driver travel until reaching a scanning speed, a second distance through which the first driver and the second driver travel during exposure and a third distance through which the first driver and the second driver travel during a settling time from a time when the first driver and the second driver reach the scanning speed to a time when exposure is enabled. The controller controls the first driver and the second driver by exposure parameters, the settling time being variably set in accordance with the exposure parameters.