The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Dec. 14, 1999
Jan Verhoeven, Kockengen, NL;
Boris Lastdrager, Amsterdam, NL;
Adriaan Tip, Castricum, NL;
Dirk K. G. De Boer, Eindhoven, NL;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
An EUV illumination system comprises an EUV radiation source unit ( ) and at least one EUV radiation-reflecting mirror ( ), which mirror comprises a multilayer structure of first layers ( ) of a first material alternating with second layers ( ) of a second material, and which radiation source unit comprises an electron source ( ) for supplying an electron beam (EB) and a medium ( ) which converts the electron beam into a beam of photons (IB). As the medium ( ) comprises at least one material that is equal to one of the materials of the mirror multilayer structure, the photon beam (IB) has a relatively large intensity.