The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Jan. 27, 2000
Applicant:
Inventor:
Jeong-Hyun Oh, Kumi-shi, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 7/14 ; C08L 5/712 ;
U.S. Cl.
CPC ...
C08K 7/14 ; C08L 5/712 ;
Abstract
A composition for production of silica glass using a sol-gel process is described, comprising silica particles, a dispersing agent, and a solution containing a polymerizable monomer for formation of acrylic resin and a crosslink agent dissolved in distilled water. The polymerizable monomer is n-methylol acrylamide or n-methylol methacrylamide. A method for production of silica glass is described, including the step of adding silica particles and a dispersing agent to a premix solution of the polymerizable monomer for formation of acrylic resin and the crosslink agent dissolved in distilled water.