The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Mar. 03, 2000
Elliott A. Gruskin, Killingworth, CT (US);
Christofer T. Christoforou, Pleasanton, CA (US);
United States Surgical Corporation, Norwalk, CT (US);
Abstract
A method of reducing scar formation at a wound site includes contacting the wound site with an effective scar reducing amount of a cross-linked polysaccharide having a positive charge and thereby reducing scar formation as the wound site heals. Such polysaccharide include bioabsorbable cross-linked dextrans or alginates. The positive charge may be provided by diethylaminoethyl (DEAE) moieties. The cross-linked polysaccharide can be applied to the wound site as a powder or bead. The cross-linked polysaccharide may also be contained in a composition including a pharmaceutically acceptable vehicle. Biocompatable surgical devices are provided with an effective scar reducing amount of a cross-linked polysaccharide having a positive charge which reduce scar formation at healing wound sites. A method of reducing TGF-&bgr; activity is also provided.