The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2002
Filed:
Sep. 20, 2000
Applicant:
Inventor:
Larry S. Wingo, Rhome, TX (US);
Assignee:
Poco Graphite, Inc., Decatur, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; B29D 2/200 ; B29D 2/300 ; B32B 1/08 ;
U.S. Cl.
CPC ...
C23C 1/434 ; B29D 2/200 ; B29D 2/300 ; B32B 1/08 ;
Abstract
A rotatable sputter target for use in a sputtering system having a sleeve of sputtering material attached to a structural support tube such that an annular space is formed between the inside surface of the sleeve and the outside surface of the support tube. The annular space is at least partly filled with a thermally and electrically conductive material which flows at ambient temperature. The annular space is sealed at either end so that the material cannot escape the annular space.
Wingo, Larry. (2002). Rotatable sputter target (U.S. Patent No. 6409897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6409897
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile