The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2002

Filed:

Mar. 05, 1999
Applicant:
Inventors:

Krupashankara M. Sethuram, Falls Church, VA (US);

Raja Kalyanaraman, Fairfax, VA (US);

Assignee:

Materials Modifciation, Inc., Fairfax, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/6511 ; C23C 1/6513 ;
U.S. Cl.
CPC ...
C23C 1/6511 ; C23C 1/6513 ;
Abstract

The present invention relates to the production of ultrafine powders using a microwave plasma apparatus and chemical synthesis technique. Microwaves generated by a magnetron ( ) are passed through waveguides ( ) before they arrive at the head of a plasmatron ( ). These high energy microwaves ionize a plasma gas, thus releasing large amounts of energy. The energy thus released is utilized to initiate and sustain chemical reactions between the desired elements being pumped in a spiral pattern into the plasmatron ( ). The reaction products are quenched rapidly in a reactor column ( ) into ultrafine powders.


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