Procedure and device for calibrating the gas pressure in a process vacuum chamber (receiver)

Abstract

A system for treating goods, in particular for coating optical substrates, under a vacuum, within a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, includes a device for calibrating the gas pressure in the receiver for a respective operating cycle. The calibrating device has a calibration pressure vessel ( ) having a volume (v) lower than the volume (V) of the receiver ( ) and is connected in terms of flow with an inert gas source and the receiver ( ) via actuatable valve fittings ( ), wherein the receiver ( ) and calibration pressure vessel ( ) are each linked via a pressure gage ( or ) with a computer ( ), which controls the valve fittings ( ) for introducing the gas into the calibration pressure vessel ( ) or receiver ( ) by way of a downstream controller ( ). The measures of the calibration device make it possible to calibrate the gas pressures in a gas-tight sealable, evacuatable vacuum chamber (receiver) that can be provided with an inert gas atmosphere, in such a way as to repeatedly ensure a preset, constant gas concentration in the receiver within an operating or treatment cycle.