The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
Jun. 21, 2000
Wisertek International Corporation, Hsinchu, TW;
Abstract
A method according to the invention comprises the following steps. At first, a first layer of film is coated over a micro-control apparatus having a plurality of ejecting elements. Next, a plurality of ink chambers, a plurality of ink channels, and a plurality of supporting cylinders are simultaneously formed in the first layer of film by photolithography. More specifically, the plurality of supporting cylinders is located within the plurality of ink channels. Thereafter, a layer of liquid medium is coated over the first layer of film. A photosensitive film is provided over the first layer of film, and then a plurality of ink orifices is formed therein at positions respectively corresponding to the plurality of ink chambers by photolithography. Finally, the micro-control apparatus is connected to a signal input means. Accordingly, a precision alignment of application between ink orifices and ink chambers in manufacturing a conventional printhead is not necessary so that the throughput and yield rate can be increased.