The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
Nov. 10, 1998
Takahiro Hasegawa, Gyoda, JP;
Shigeru Sugawara, Saitama-ken, JP;
Fumihito Suzuki, Fukaya, JP;
Fumio Miyanaga, Kasai, JP;
Katsumi Yaha, Himeji, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A coating apparatus for forming a high-resistance film on the inner surface of the neck of the funnel of a cathode ray tube has a nozzle that can be inserted into the neck. The nozzle, which is provided for applying a material liquid to the inner surface of the neck, has a jet hole inclined toward the direction of gravity. The material liquid applied through the jet hole thus inclined scarcely flows upwardly on the inner surface of the neck. The liquid therefore forms a high-resistance film having a uniform thickness on the inner surface of the neck of the funnel. Having a uniform thickness, the high-resistance film inhibits the charge-up of the neck potential, reducing the convergence drift caused by the charge-up of the neck potential.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile