The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
Feb. 08, 1999
Chris R. Manners, Moorpark, CA (US);
Michelle D. Guertin, Valencia, CA (US);
Hop D. Nguyen, Quartz Hill, CA (US);
Jouni P. Partanen, Los Angeles, CA (US);
Nansheng Tang, Valencia, CA (US);
Michael A. Everett, Saugus, CA (US);
3D Systems, Inc., Valencia, CA (US);
Abstract
A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects on a layer by layer basis by selectively exposing layers of material to prescribed stimulation, using a beam having a first smaller diameter and a beam having a second larger diameter, to form laminae of the object. The power of the smaller beam is typically lower than the power of the larger beam. Object formation is controlled by data representing portions of the layers to be exposed with the larger beam (large spot portions) and those portions to be exposed with the smaller beam (small spot portions). In a preferred embodiment, portions exposed with the larger beam are formed first, for a given layer. Portions are exposed with the small beam next. Thereafter the entire perimeter of the laminae is traced using the small beam. Data manipulation techniques are used to identify which portions may be formed with the large beam to decrease exposure time and which should be formed with the small beam to maintain accuracy of the lamina being formed. More than two beam diameters may be used.