The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
Sep. 14, 1999
Hiroshi Takashima, Yasugi, JP;
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
Provided are a CoPt-base sputtering target which can produce a magnetic recording medium having a recording layer with uniform film characteristics and excellent recording and reproducing characteristics, a method of making this sputtering target, a magnetic recording film, and a CoPt-base magnetic recording medium. The CoPt-base sputtering target contains Co as the principal component, Pt as an indispensable element, and at least one element selected from the group consisting of the 4a group elements, 5a group elements, 6a group elements, B and C, and the target has a structure in which the maximum inscribed circle diameter of a phase consisting of a Pt simple substance is substantially not more than 500 &mgr;m and in which the thickness of a diffusion layer at the boundary of the Pt phase is substantially not more than 50 &mgr;m. By using this target, it is possible to obtain a magnetic recording film which is used in a hard disk, etc., having a uniform Pt distribution in which the difference in the analytical value of the Pt content measured in the radial direction of the disk is not more than ±10%.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile