The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2002
Filed:
Apr. 21, 2000
Yusuke Ebata, Tenri, JP;
Tohru Okuda, Nara, JP;
Sharp Kaubushiki Kaisha, Osaka, JP;
Abstract
A method for treating a surface of a sample using plasma, including the steps of placing the sample in a predetermined atmosphere, locally supplying a reaction gas from a reaction gas supply portion to a vicinity of the sample, providing a wall surface opposed to the sample, providing a gas flow path having a low conductance from the reaction gas supply portion to the atmosphere, and locally forming a high-pressure reaction gas region having a pressure higher than the atmosphere in the gas flow path having a low conductance, and generating locally high-pressure plasma based on the reaction gas in the high-pressure reaction gas region; and subjecting the sample to surface treatment using an active seed in the high-pressure plasma.