The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Mar. 04, 1997
John R. Wootton, County of St Louis, MO (US);
Gary Waldman, County of St Louis, MO (US);
David L. Holder, County of St. Charles, MO (US);
Engineered Support Systems, Inc., St. Louis, MO (US);
Abstract
A method for effecting the desired optical characteristics of an optical system ( ) using phase diffractive optics. Incident light (B ) is directed onto a surface ( ) of a material ( ) whose index of refraction (n) is variable over the material. Passage of the incident light through the material effects the phase and amplitude of the light waveform. An optical map (O ) is determined for the surface of the material. This map comprises variations in the index of refraction over the material surface, and the map, in effect, represents any of a range of refractive and diffractive optical elements such as a mirror ( ), a lens ( ), or a diffraction grating ( ). The map is dynamically written onto the material to map the material such that the incident light's passage through the material corresponds to the passage of the light through the optical element currently emulated by the material. As a result, emergent light (B ) from the material has similar amplitude and phase characteristics as if the incident light had passed through the desired optical element.