The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2002

Filed:

Oct. 30, 2000
Applicant:
Inventors:

Dae-je Chin, Seoul, KR;

Hyung-jae Shin, Seongnam, KR;

Sang-hun Lee, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/600 ; G02B 2/602 ;
U.S. Cl.
CPC ...
G02B 2/600 ; G02B 2/602 ;
Abstract

A micro-mirror device and associated method, the device including a substrate, address electrodes provided on the substrate, and a micro-mirror facing the substrate and spaced a predetermined distance from the substrate. The micro-mirror device is adapted so that the slope of the micro-mirror can be adjusted by electrostatic attraction forces between the address electrodes and the micro-mirror. The micro-mirror device further includes auxiliary electrodes formed on and projected from the substrate. The upper portions of the auxiliary electrodes are disposed in the vicinity of the micro-mirror, so that distances between the micro-mirror and the auxiliary electrodes can remain small, even when the micro-mirror is inclined by electrostatic attraction forces in one direction. Accordingly, restoration of the micro-mirror is enhanced by electrostatic attraction forces of the auxiliary electrodes.


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