The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Apr. 07, 1999
Applicant:
Inventor:
Shin Matsui, Urawa, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/100 ;
U.S. Cl.
CPC ...
G01B 1/100 ;
Abstract
A positioning stage system includes a first stage movable at least in one of a rotational direction and a tilt direction, a second stage movable at least in X and Y directions, a measurement mirror system fixed to the second stage, a reference mirror system disposed on the first stage, and a measuring system for measuring displacement of the measurement mirror system in the X or Y direction, while using the reference mirror system as a positional reference, wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence direction, substantially constantly.