The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Oct. 13, 1999
Wolf-Dieter Hergeth, Julbach, DE;
Richard Becker, Emmerting, DE;
Mehmet Gunaltay, Emmerting, DE;
Herbert Jekat, Unterwoessen, DE;
Frank Rindfleisch, Koeln-Fuehlingen, DE;
Heribert Wendenburg, Winhoering, DE;
Wacker Chemie GmbH, Munich, DE;
Abstract
The invention provides a process for heterophase reactions in a liquid or supercritical dispersion medium, in which the starting materials are introduced into the reaction zone of a reactor provided with one or more enrichment zones and the reaction product or unreacted starting material or both starting material and reaction product are discharged via one enrichment zone in each case, wherein a) the reaction product together with the dispersion medium is discharged from the reactor via an enrichment zone, the reaction product is separated off and the dispersion medium is, if desired in countercurrent to the reaction product/dispersion medium mixture and via an enrichment zone, returned to the reaction zone, or b) unreacted starting material together with the dispersion medium is discharged, the starting material is separated from the dispersion medium and returned directly to the reaction zone and the dispersion medium is, if desired, in countercurrent to the reaction product/dispersion medium mixture and via an enrichment zone, returned to the reaction zone, or the steps a) and b) are combined with one another.