The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Oct. 19, 2000
Thierry Lagarde, Vif, FR;
Jacques Pelletier, Saint Martin d'Heres, FR;
Metal Process (Societe a Responsabilite Limitee), Montevrain, FR;
Abstract
A method of producing a plasma by capacitive discharges between an active electrode and a passive electrode within a sealed chamber at controlled pressure, the passive electrode being placed at a given electric potential while the active electrode is fed with a discharge-maintaining voltage. The active electrode and passive electrode define a separation plane therebetween parallel to the electrodes. According to the method, a multipole magnetic barrier is placed between the electrodes within the sealed chamber, the multipole magnetic barrier producing magnetic field lines extending across the separation plane. Fast electrons accelerated by the active electrode are caused to oscillate between magnetic poles in order to create plasma production and diffusion zones that are situated on either side of a magnetic barrier facing each of the electrodes.