The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Mar. 10, 2000
Applicant:
Inventors:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/039 ;
U.S. Cl.
CPC ...
G03F 7/039 ;
Abstract
The present invention relates to a process for forming a photoresist pattern which improves its resistance to the harmful effects of post exposure delay. More specifically, it relates to an improved process for forming a photoresist pattern comprising the steps of (a) coating a photoresist composition on a wafer, (b) exposing the coated wafer to patterned light by employing an exposer, and (c) developing the exposed wafer, wherein the improvement comprises raising the temperature of the photoresist to above room temperature when it is coated on the wafer.