The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Nov. 01, 2000
Yeon Hee Lee, Seoul, KR;
Seung Hee Han, Seoul, KR;
Korea Institute of Science & Technology, Seoul, KR;
Abstract
A method for surface modification of 3-dimensional bulk polymers is provided to improve surface properties and surface conductivity of 3-dimensional bulk polymers by using plasma source ion implantation technique. The plasma source ion implantation technique is to modify the surface by implanting ions into the surface of the 3-dimensional samples uniformly. When negative high voltage pulse is applied to a metallic grid around the bulk polymer samples, ions are extracted from the plasma; most of ions passing the grid and collide with the surface of the bulk polymer samples in high energy. Therefore, through the method for applying high voltage pulse to the grid around samples, ions are implanted into the surface of the 3-dimensional bulk polymer samples uniformly, and thereby the ions implanted in high energy modify the bulk polymer surface to improve the electrical conductivity effectively.